Free Access
Issue |
Analusis
Volume 26, Number 8, October 1998
Chemometrics 98
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Page(s) | 281 - 283 | |
Section | Original articles | |
DOI | https://doi.org/10.1051/analusis:1998172 |
Analusis 26, 281-283 (1998)
DOI: 10.1051/analusis:1998172
1 LEPMI, ENSEEG, UMR 5631 INPG-CNRS, Domaine Universitaire, 1130 rue de la piscine, BP. 75, 38402 Saint Martin d'Hères Cedex, France
2 Alcatel Alsthom Recherche, Route de Nozay, 91460 Marcoussis, France
Key words: Electrodeposition process / computer experiments / design of experiments / response surface methodology / desirability functions.
© EDP Sciences, Wiley-VCH 1998
DOI: 10.1051/analusis:1998172
Optimizing an electrochemical deposition process by use of design of computer experiments
D. Rabiot1, J.-P. Caire1, B. Nguyen1, E. Chainet1 and F. Gerard21 LEPMI, ENSEEG, UMR 5631 INPG-CNRS, Domaine Universitaire, 1130 rue de la piscine, BP. 75, 38402 Saint Martin d'Hères Cedex, France
2 Alcatel Alsthom Recherche, Route de Nozay, 91460 Marcoussis, France
Abstract
A response surface methodology only based in this case on computer experiments was used in conjunction with the desirability concept to optimize a priori an electrodeposition process designed
for production of gold-tin alloy bumps on a 4 inches wafer. The efficiency of the method was used to achieve at a cheap cost with a small number of computer experiments the technical
specifications required in term of metal deposit thickness uniformity.
Key words: Electrodeposition process / computer experiments / design of experiments / response surface methodology / desirability functions.
© EDP Sciences, Wiley-VCH 1998