Free Access
Volume 26, Number 8, October 1998
Chemometrics 98
Page(s) 281 - 283
Section Original articles
Analusis 26, 281-283 (1998)
DOI: 10.1051/analusis:1998172

Optimizing an electrochemical deposition process by use of design of computer experiments

D. Rabiot1, J.-P. Caire1, B. Nguyen1, E. Chainet1 and F. Gerard2

1  LEPMI, ENSEEG, UMR 5631 INPG-CNRS, Domaine Universitaire, 1130 rue de la piscine, BP. 75, 38402 Saint Martin d'Hères Cedex, France
2  Alcatel Alsthom Recherche, Route de Nozay, 91460 Marcoussis, France

A response surface methodology only based in this case on computer experiments was used in conjunction with the desirability concept to optimize a priori an electrodeposition process designed for production of gold-tin alloy bumps on a 4 inches wafer. The efficiency of the method was used to achieve at a cheap cost with a small number of computer experiments the technical specifications required in term of metal deposit thickness uniformity.

Key words: Electrodeposition process / computer experiments / design of experiments / response surface methodology / desirability functions.

© EDP Sciences, Wiley-VCH 1998