Issue |
Analusis
Volume 28, Number 10, December 2000
Structure elucidation by LC-MS
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Page(s) | 966 - 972 | |
Section | Original articles | |
DOI | https://doi.org/10.1051/analusis:2000163 |
DOI: 10.1051/analusis:2000163
UV spectrophotometry for monitoring toxic gases
E. Dupuit, A. Dandrieux, P. Kvapil, J. Ollivier, G. Dusserre and O. ThomasÉcole des Mines d'Alès, 6 avenue de Clavières, 30319 Alès Cedex, France
(Received August 9, 2000; revised December 14; accepted December 18, 2000.)
Abstract
The need for gas compound measurement concerns overall three domains:
environmental monitoring, emission measurement and risk assessment.
These fields are different because of concentration range (from 10-3
to thousands mgm-3). A fast technique has been developed based on UV
spectrophotometry. Simple robust optics and absence of interference
from water vapour and carbon dioxide are two of the main benefits of
this method. All measurements are performed with a quartz flow cell of
10 cm pathlength. In this condition, the detection limits of various
compounds (ammonia, hydrogen sulphide, sulphur dioxide, benzene, toluene,
ethylbenzene and p-xylene) vary between 30 and 100 mg
m-3. This UV spectrometry
system has been tested with success in two applications. The first one is during
gaseous ammonia dispersion, simulating a chemical accident. The second one is
BTEX monitoring measurement in a process control of soil remediation. In this
case, UV is associated with spectral data treatment software. All results are
compared with reference methods (Nessler reagent for ammonia, gas chromatography
for BTEX). An acceptable agreement was found.
Key words: UV spectrophotometry -- gaseous phase -- toxic gas -- analysis.
© EDP Sciences, Wiley-VCH 2000